Relating human and AI-based detection limits in scanning electron microscopy dimensional metrology [0.03%]
扫描电子显微镜尺寸计量中人类和基于人工智能的检测限的关系
Peter Bajcsy,Pushkar Sathe,Andras A Vladar
Peter Bajcsy
Background: Nanoscale measurements of critical dimensions in semiconductor manufacturing rely on scanning electron microscopy (SEM) and SEM image analyses. The acquisition of SEM images requires a low primary electron bea...
Multiple-Instrument Evaluation of the Consistency and Long Term Stability of Tip Width Calibration for Critical Dimension Atomic Force Microscopy [0.03%]
用于关键尺寸原子力显微镜针尖宽度刻度的一致性和长期稳定性的多重仪器评估
Ronald G Dixson,Ndubuisi G Orji
Ronald G Dixson
Since 2004 standards for calibration of critical dimension atomic force microscope (CD-AFM) tip width have been available both commercially and through national metrology institutes (NMIs) - such as the National Institute of Standards and T...
Mark-Alexander Henn,Bryan M Barnes,Hui Zhou
Mark-Alexander Henn
Optical 3D nanostructure metrology utilizes a model-based metrology approach to determine critical dimensions (CDs) that are well below the inspection wavelength. Our project at the National Institute of Standards and Technology is evaluati...
Tip on Tip Imaging and Self-Consistent Calibration for Critical Dimension Atomic Force Microscopy: Refinements and Extension to Second Lateral Axis [0.03%]
悬臂梁敲击扫描探针显微镜的测量与标定方法研究及优化
Ronald Dixson
Ronald Dixson
One type of atomic force microscopy (AFM) used for critical dimension (CD) metrology is commonly referred to as critical dimension atomic force microscopy (CD-AFM); it uses flared tips and two-dimensional surface sensing to enable scanning ...
Ndubuisi G Orji,Ronald G Dixson,Ernesto Lopez et al.
Ndubuisi G Orji et al.
Nanoscale wear affects the performance of atomic force microscopy (AFM)-based measurements for all applications including process control measurements and nanoelectronics characterization. As such, methods to prevent or reduce AFM tip wear ...
Methodology for evaluating the information distribution in small angle scattering from periodic nanostructures [0.03%]
周期纳米结构小角散射中信息分布的评估方法
Daniel F Sunday,R Joseph Kline
Daniel F Sunday
Optimizing the extraction of information from x-ray measurements while minimizing exposure time is an important area of research in a variety of fields. The semiconductor industry is reaching a point where the traditional optical metrologie...
Design and characterization of a package-less hybrid PDMS-CMOS-FR4 contact-imaging system for microfluidic integration [0.03%]
一种适用于微流控集成的无封装混合PDMS-CMOS-FR4接触式成像系统的研制与表征
Andres Galan,Gregory P Nordin,Shiuh-Hua Wood Chiang
Andres Galan
We demonstrate a hybrid "package-less" polydimethylsiloxane (PDMS)-complementary-metal-oxide-semiconductor (CMOS)-FR4 system for contact imaging. The system embeds the CMOS image sensor directly in a PDMS layer instead of the standard chip ...
Matthew Hamblin,Thane Downing,Sophia Anderson et al.
Matthew Hamblin et al.
Methods exist for the creation of antireflective thin film layers; however, many of these methods depend on the use of high temperatures, harsh chemical etches, or are made with difficult pattern materials, rendering them unusable for many ...
Evaluation of carbon nanotube probes in critical dimension atomic force microscopes [0.03%]
用于原子力显微镜的碳纳米管探针评估研究
Jinho Choi,Byong Chon Park,Sang Jung Ahn et al.
Jinho Choi et al.
The decreasing size of semiconductor features and the increasing structural complexity of advanced devices have placed continuously greater demands on manufacturing metrology, arising both from the measurement challenges of smaller feature ...
Adam F Hannon,Daniel F Sunday,Donald Windover et al.
Adam F Hannon et al.
We compare the speed and effectiveness of two genetic optimization algorithms to the results of statistical sampling via a Markov chain Monte Carlo algorithm to find which is the most robust method for determining real space structure in pe...