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期刊名:Ieee electron device letters

缩写:IEEE ELECTR DEVICE L

ISSN:0741-3106

e-ISSN:1558-0563

IF/分区:4.5/Q2

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共收录本刊相关文章索引6
Clinical Trial Case Reports Meta-Analysis RCT Review Systematic Review
Classical Article Case Reports Clinical Study Clinical Trial Clinical Trial Protocol Comment Comparative Study Editorial Guideline Letter Meta-Analysis Multicenter Study Observational Study Randomized Controlled Trial Review Systematic Review
T Chidambaram,D Veksler,S Madisetti et al. T Chidambaram et al.
In this work, we use gated Hall method for direct measurement of free carrier density and electron mobility in inversion InGaAs MOSFET channels. At room temperature, the highest Hall mobility of 1800 cm2/Vs is observed at electron density i...
Jorge A Cardenas,Shiheng Lu,Nicholas X Williams et al. Jorge A Cardenas et al.
Ion gel-based dielectrics have long been considered for enabling low-voltage operation in printed thin-film transistors (TFTs), but their compatibility with in-place printing (a streamlined, direct-write printing approach where devices neve...
Xiaochen Wang,Xiang Meng,Yangzhi Zhu et al. Xiaochen Wang et al.
Wearable and implantable pressure sensors are in great demand for personalized health monitoring. Pressure sensors with low operation voltage and low power-consumption are desired for energy-saving devices. Organic iontronic devices, such a...
Daniel A Fleischer,Siddharth Shekar,Shanshan Dai et al. Daniel A Fleischer et al.
In this work, we present a CMOS-integrated low-noise junction field-effect transistor (JFET) developed in a standard 0.18 pm CMOS process. These JFETs reduce input-referred flicker noise power by more than a factor of 10 when compared to eq...
Wenjun Li,Matt D Brubaker,Bryan T Spann et al. Wenjun Li et al.
Wrap-around gate GaN nanowire MOSFETs using Al2O3 as gate oxide have been experimentally demonstrated. The fabricated devices exhibit a minimum subthreshold slope of 60 mV/dec, an average subthreshold slope of 68 mV/dec over three decades o...
David M Nminibapiel,Dmitry Veksler,J-H Kim et al. David M Nminibapiel et al.
The stochastic nature of the conductive filaments in oxide-based resistive memory (RRAM) represents a sizeable impediment to commercialization. As such, program-verify methodologies are highly alluring. However, it was recently shown that p...