Zhang, P.; Hong, R. Y.; Chen et al.
Zhang et al.
B. A. Mansour; S. H. Moustafa; M. A. El-Hagary
B. A. Mansour; S. H. Moustafa; M. A. El-Hagary
Barrier inhomogeneities in titanium Schottky contacts formed on argon plasma etchedp-type Si0.95Ge0.05 [0.03%]
氩等离子体刻蚀形成的p型Si0.95Ge0.05上钛肖特基接触中的势垒不均匀性
Mamor, M.; Bouziane, K.; Tirbiyine et al.
Mamor et al.
Structural, morphological, optical and electrical evolution of spray deposited ZnO rods co-doped with indium and sulphur atoms [0.03%]
喷雾沉积掺杂铟和硫原子的ZnO棒的结构、形貌、光学及电学演化特性
Yılmaz, S.; Polat, İ.; Atasoy et al.
Yılmaz et al.
Solution route synthesis and characterization of nanocrystalline Bi2Ru2O7for usage in resistor paste application [0.03%]
用于电阻浆料应用的纳米晶Bi2Ru2O7的溶液法合成与表征
K. Gurunathan; N. P. Vyawahare; G. J. Phatak; D. P. Amalnerkar
K. Gurunathan; N. P. Vyawahare; G. J. Phatak; D. P. Amalnerkar
Effect of La-doping content on the dielectric and ferroelectric properties of 0.88Pb(Mg1/3Nb2/3)O3–0.12PbTiO3ceramics [0.03%]
La掺杂含量对0.88Pb(Mg1/3Nb2/3)O3–0.12PbTiO3陶瓷介电和铁电性能的影响
Zhang, J. R.; Zhang, Y. C.; Lu et al.
Zhang et al.
Influence of the substrate temperature on the optical and electrical properties of Ga-doped ZnO thin films fabricated by pulsed laser deposition [0.03%]
基底温度对脉冲激光沉积法制备的镓掺杂氧化锌薄膜光学与电学性能的影响
Hyun Ho Shin; Yang Hee Joung; Seong Jun Kang
Hyun Ho Shin; Yang Hee Joung; Seong Jun Kang
Electrohydrodynamic atomization approach to graphene/zinc oxide film fabrication for application in electronic devices [0.03%]
用于电子器件应用的石墨烯/氧化锌薄膜制备的电液动力雾化方法
Ali, Adnan; Ali, Kamran; Kwon et al.
Ali et al.
The enhanced ammonia gas-sensing activity of gamma ray irradiated indium vanadate nanoribbons [0.03%]
伽马射线辐照的钒酸铟纳米带增强的氨气传感活性
Yin, Kui; Liu, Shanshan; Cai et al.
Yin et al.