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International Journal of Surface Science and Engineering. 2009;3(1/2):64-. doi: 10.1504/IJSURFSE.2009.024362 Q41.22025

Determination of Young's modulus and yield strength of porous low-k dielectric films by nanoindentation under complete consideration of the substrate influence

完全考虑基底影响的纳米压痕法测定多孔低k介电薄膜的杨氏模量和屈服强度

Herrmann, M.; Richter, F.

DOI: 10.1504/IJSURFSE.2009.024362

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Copyright © International Journal of Surface Science and Engineering. 中文内容为AI机器翻译,仅供参考!

期刊名:International journal of surface science and engineering

缩写:INT J SURF SCI ENG

ISSN:1749-785X

e-ISSN:1749-7868

IF/分区:1.2/Q4

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Determination of Young's modulus and yield strength of porous low-k dielectric films by nanoindentation under complete consideration of the substrate influence