International Journal of Surface Science and Engineering. 2009;3(1/2):64-. doi: 10.1504/IJSURFSE.2009.024362 Q41.22025
Determination of Young's modulus and yield strength of porous low-k dielectric films by nanoindentation under complete consideration of the substrate influence
完全考虑基底影响的纳米压痕法测定多孔低k介电薄膜的杨氏模量和屈服强度
DOI: 10.1504/IJSURFSE.2009.024362
摘要

期刊名:International journal of surface science and engineering
缩写:INT J SURF SCI ENG
ISSN:1749-785X
e-ISSN:1749-7868
IF/分区:1.2/Q4
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Determination of Young's modulus and yield strength of porous low-k dielectric films by nanoindentation under complete consideration of the substrate influence