Chinese Physics Letters. 2014;31(2):027702-. doi: 10.1088/0256-307X/31/2/027702 Q14.22025
Band Alignment and Band Gap Characterization of La 2 O 3 Films on Si Substrates Grown by Radio Frequency Magnetron Sputtering
采用射频磁控溅射法在硅衬底上生长的La₂O₃薄膜的能带对齐与禁带特性表征
DOI: 10.1088/0256-307X/31/2/027702
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