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Journal of Intelligent Manufacturing. 2016;27(3):581-593. doi: 10.1007/s10845-014-0893-8 Q17.42025

The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the(hbox {SiO}_mathrm{x}hbox {N}_mathrm{y})film parameter optimization

Kuo, Chung-Feng Jeffrey; Lan, Wei-Lun; Chang, Yu-Cheng; Lin, Kun-Wei

DOI: 10.1007/s10845-014-0893-8

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Copyright © Journal of Intelligent Manufacturing. 中文内容为AI机器翻译,仅供参考!

期刊名:Journal of intelligent manufacturing

缩写:J INTELL MANUF

ISSN:0956-5515

e-ISSN:1572-8145

IF/分区:7.4/Q1

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The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the(hbox {SiO}_mathrm{x}hbox {N}_mathrm{y})film parameter optimization