Journal of Intelligent Manufacturing. 2016;27(3):581-593. doi: 10.1007/s10845-014-0893-8 Q17.42025
The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the(hbox {SiO}_mathrm{x}hbox {N}_mathrm{y})film parameter optimization
DOI: 10.1007/s10845-014-0893-8
摘要

期刊名:Journal of intelligent manufacturing
缩写:J INTELL MANUF
ISSN:0956-5515
e-ISSN:1572-8145
IF/分区:7.4/Q1
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The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the(hbox {SiO}_mathrm{x}hbox {N}_mathrm{y})film parameter optimization