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Chinese Physics Letters. 2006;23(11):3018-3021. doi: 10.1088/0256-307X/23/11/037 Q14.22025

Preparation and Microstructure of Tantalum Nitride Thin Film by Cathodic Arc Deposition

Li, Li; Er-Wu, Niu; Guo-Hua, Lv; Wen-Ran, Feng; Wei-Chao, Gu; Guang-Liang, Chen; Gu-Ling, Zhang; Song-Hua, Fan; Chi-Zi, Liu; Si-Ze, Yang

DOI: 10.1088/0256-307X/23/11/037

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Copyright © Chinese Physics Letters. 中文内容为AI机器翻译,仅供参考!

期刊名:Chinese physics letters

缩写:CHINESE PHYS LETT

ISSN:0256-307X

e-ISSN:1741-3540

IF/分区:4.2/Q1

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Preparation and Microstructure of Tantalum Nitride Thin Film by Cathodic Arc Deposition