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IEEE Transactions on Very Large Scale Integration (VLSI) Systems. 2006;14(6):646-649. doi: 10.1109/TVLSI.2006.878226 Q23.22025

A process variation compensating technique with an on-die leakage current sensor for nanometer scale dynamic circuits

一种带片上漏电流传感器的工艺变异补偿技术,适用于纳米级动态电路

Kim, C.H.; Roy, K.; Hsu, S.; Krishnamurthy, R.; Borkar, S.

DOI: 10.1109/TVLSI.2006.878226

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期刊名:Ieee transactions on very large scale integration (vlsi) systems

缩写:IEEE T VLSI SYST

ISSN:1063-8210

e-ISSN:1557-9999

IF/分区:3.2/Q2

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A process variation compensating technique with an on-die leakage current sensor for nanometer scale dynamic circuits