首页 正文

Advanced Optical Technologies. 2012;1(4):-. doi: 10.1515/aot-2012-0037 Q23.22025

Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization

计算光刻建模综述:聚焦于拓展光学光刻及设计-技术协同优化

Lai, Kafai

DOI: 10.1515/aot-2012-0037

摘要

Copyright © Advanced Optical Technologies. 中文内容为AI机器翻译,仅供参考!

期刊名:Advanced optical technologies

缩写:

ISSN:2192-8576

e-ISSN:2192-8584

IF/分区:3.2/Q2

文章目录 更多期刊信息

全文链接
引文链接
复制
已复制!
推荐内容
Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization