首页 正文

Journal of materials science-materials in electronics. 2008;19(2):137-142. doi: 10.1007/s10854-007-9306-5 Q23.22025

In-situ optical reflectance and synchrotron X-ray topography study of defects in epitaxial dilute GaAsN on GaAs

外延生长于GaAs衬底上的稀释GaAsN中缺陷的原位光学反射率与同步辐射X射线形貌学研究

O. Reentilä; A. Lankinen; M. Mattila; A. Säynätjoki; T. O. Tuomi; H. Lipsanen; L. O’Reilly; P. J. McNally

DOI: 10.1007/s10854-007-9306-5

摘要 查看摘要

Copyright © . 中文内容为AI机器翻译,仅供参考!

期刊名:Journal of materials science-materials in electronics

缩写:J MATER SCI-MATER EL

ISSN:0957-4522

e-ISSN:1573-482X

IF/分区:3.2/Q2

文章目录 更多期刊信息

全文链接
引文链接
复制
已复制!
推荐内容
In-situ optical reflectance and synchrotron X-ray topography study of defects in epitaxial dilute GaAsN on GaAs