Journal of materials science-materials in electronics. 1994;5(6):370-374. doi: 10.1007/bf00215576 Q23.22025
Quantum confinement effects of Si/SiGe strained-layer superlattices grown by an ultrahigh vacuum/chemical vapor deposition technique
采用超高真空/化学气相沉积技术生长的Si/SiGe应变层超晶格的量子限域效应
DOI: 10.1007/bf00215576
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期刊名:Journal of materials science-materials in electronics
缩写:J MATER SCI-MATER EL
ISSN:0957-4522
e-ISSN:1573-482X
IF/分区:3.2/Q2
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Quantum confinement effects of Si/SiGe strained-layer superlattices grown by an ultrahigh vacuum/chemical vapor deposition technique
