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Journal of materials science-materials in electronics. 1994;5(6):370-374. doi: 10.1007/bf00215576 Q23.22025

Quantum confinement effects of Si/SiGe strained-layer superlattices grown by an ultrahigh vacuum/chemical vapor deposition technique

采用超高真空/化学气相沉积技术生长的Si/SiGe应变层超晶格的量子限域效应

T. C. Chang; C. Y. Chang; T. G. Jung; P. A. Chen; W. C. Tsai; P. J. Wang; Y. F. Chen; S. C. Pan

DOI: 10.1007/bf00215576

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期刊名:Journal of materials science-materials in electronics

缩写:J MATER SCI-MATER EL

ISSN:0957-4522

e-ISSN:1573-482X

IF/分区:3.2/Q2

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Quantum confinement effects of Si/SiGe strained-layer superlattices grown by an ultrahigh vacuum/chemical vapor deposition technique