XeF2 gas assisted focused electron beam induced etching of niobium thin films: towards direct write editing of niobium superconducting devices
{{output}}
In this work, we explore focused electron beam induced etching (FEBIE) of niobium thin films with the XeF2 precursor as a route to edit, on-the-fly, superconducting devices. We report the effect of XeF2 pressure, electron beam current, beam energy, and dwell t... ...
