Effect of Annealing on Surface Morphology and Wettability of NC-FeSi₂ Films Produced via Facing-Target Direct-Current Sputtering
{{output}}
Nanocrystalline iron disilicide (NC-FeSi₂) films were created at room temperature by facing-target direct current sputtering. The NC-FeSi₂ films were annealed at different temperatures of 300 °C, 600 °C, and 900 °C under high vacuum for 2 hours. XRD resul... ...
