Low Temperature Plasma for the Preparation of Crater Walls for Compositional Depth Profiling of Thin Inorganic Multilayers
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An indirect, compositional depth profiling of an inorganic multilayer system using a helium low temperature plasma (LTP) containing 0.2% (v/v) SF6 was evaluated. A model multilayer system consisting of four 10 nm layers of silicon separated by four 50 nm layer... ...
