Induction of Strand Breaks in DNA films by Low Energy Electrons and Soft X-ray under Nitrous Oxide Atmosphere
{{output}}
Five-monolayer (5ML) plasmid DNA films deposited on glass and tantalum substrates were exposed to Al Kα X-rays of 1.5 keV under gaseous nitrous oxide (N2O) at atmospheric pressure and temperature. Whereas the damage yields for DNA deposited on glass are due t... ...
