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Journal of photopolymer science and technology = [Fotoporima Konwakai shi]. 2013;25(1):53-56. doi: 10.2494/photopolymer.25.53 Q40.42024

Polymer Brushes as Functional, Patterned Surfaces for Nanobiotechnology

用于纳米生物技术的功能型图案化聚合物刷毛表面 翻译改进

M Elizabeth Welch  1, Youyong Xu  2, Hongjun Chen  3, Norah Smith  3, Michele E Tague  3, Héctor D Abruña  3, Barbara Baird  3, Christopher K Ober  1

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作者单位

  • 1 Department of Chemistry and Chemical Biology, Cornell University, Ithaca, NY, USA ; Department of Materials Science & Engineering Cornell University, Ithaca, NY, USA.
  • 2 Department of Materials Science & Engineering Cornell University, Ithaca, NY, USA.
  • 3 Department of Chemistry and Chemical Biology, Cornell University, Ithaca, NY, USA.
  • DOI: 10.2494/photopolymer.25.53 PMID: 25484522

    摘要 Ai翻译

    Polymer brushes have many desirable characteristics such as the ability to tether molecules to a substrate or change the properties of a surface. Patterning of polymer films has been an area of great interest due to the broad range of applications including bio-related and medicinal research. Consequently, we have investigated patterning techniques for polymer brushes which allow for two different functionalities on the same surface. This method has been applied to a biosensor device which requires both polymer brushes and a photosensitizer to be polymerized on a patterned gold substrate. Additionally, the nature of patterned polymer brushes as removable thin films was explored. An etching process has enabled us to lift off very thin membranes for further characterization with the potential of using them as Janus membranes for biological applications.

    Keywords: Polymer brushes; lift off; multifunctional surfaces; patterning; thin films.

    Keywords:polymer brushes; functional surfaces; nanobiotechnology patterning

    Copyright © Journal of photopolymer science and technology = [Fotoporima Konwakai shi]. 中文内容为AI机器翻译,仅供参考!

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    期刊名:Journal of photopolymer science and technology

    缩写:J PHOTOPOLYM SCI TEC

    ISSN:0914-9244

    e-ISSN:

    IF/分区:0.4/Q4

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